Crystec Technology Trading GmbH

The Ångström Laboratory at Uppsala University, Sweden, has established a close collaboration with the companies JTEKT Thermo Systems Co., Ltd. (previously Koyo) and Crystec Technology Trading GmbH in the field of semiconductor furnace technology.

The Ångström Laboratory is the materials research center of Uppsala University. The institute conducts research in the field of new materials and provides education for students. Integrated devices, solar cells, electrical batteries and fatigue‑resistant mechanical components are important areas of the institute's work. The institute maintains many collaborations, employs around 350 staff, educates 1000 students and has an annual budget of 200 MSEK.

The heart of the institute is the cleanroom, completed in early 1998. The total area is 2000 m² and is divided into 30 laboratories. Most of the cleanroom is class 10,000. 150 m² are class 100 with gas lines from ceiling to floor, within which smaller zones are implemented as class 10 and class 1 cleanrooms. Temperature stability is ± 1°C. Humidity is maintained at 43 ± 3 %.

Ten vertical furnaces of the µTF type were installed in this cleanroom for the following applications:

Furnace Overview

Furnace 1

Oxidation

Oxidation — external combustion

400°C – 1100°C

Furnace 2

Oxidation

Oxidation — external combustion

400°C – 1100°C

Furnace 3

Boron Doping

Boron doping with solid source

400°C – 1100°C

Furnace 4

Phosphorus Doping

Phosphorus doping with solid source

400°C – 1100°C

Furnace 5

High Temperature

High‑temperature annealing

400°C – 1250°C

Furnace 6

Gate Oxidation

Gate oxidation — external combustion

400°C – 1100°C

Furnace 7

Post‑Metal

Post‑metal annealing — forming gas

200°C – 800°C

Furnace 8

Poly‑Silicon

Poly‑silicon deposition

400°C – 900°C

Furnace 9

Si₃N₄

Silicon‑nitride deposition

400°C – 900°C

Furnace 10

LTO / BPSG / TEOS

LTO, BPSG & TEOS

400°C – 900°C