目录
软件选用
我们选用Silcao仿真软件，此软件不支持Win11系统，请大家谨慎安装，否则会出现蓝屏，甚至会让你电脑重新安装系统。
二极管的制备
仿真代码
go athena
line x loc = 0.00 spac = 0.1
line x loc = 2.0 spac = 0.1
line y loc = 0.0 spac = 0.005
line y loc = 0.50 spac = 0.0125
line y loc = 2.0 spac = 0.1
#衬底定义
init silicon c.phosphorus=1.0e14 orientation =100 two.d
#淀积氧化层
deposit oxide thick =0.2 divisions = 2
#刻蚀氧化层
etch oxide start x=0.5 y=-0.2
etch continue x=0.5 y=0
etch continue x=1.5 y=0
etch done x=1.5 y=0.0
etch silicon left pl.x=0.5
etch silicon right pl.x=1.5
#扩散
diffuse time = 60 temp = 1100 c.boron = 1.0e15 press = 1.0
#淀积金属
etch oxide all
deposit alum thickness = 0.2 div =3
#刻蚀金属
etch alum left pl.x=0.5
etch alum right pl.x=1.5
#二极管电极的定义
electrode name = anode x = 1.0
electorde name = cathode backsi
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